Monte Carlo modeling of secondary electron imaging in three dimensions
- Author(s):
- J. S. Villarrubia ( National Institute of Standards and Technology (USA) )
- N. W. M. Ritchie ( National Institute of Standards and Technology (USA) )
- J. R. Lowney ( National Institute of Standards and Technology (USA) )
- Publication title:
- Metrology, inspection, and process control for microlithography XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6518
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466372 [0819466379]
- Language:
- English
- Call no.:
- P63600/6518
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Monte-Carlo simulations of arterial imaging with optical coherence tomography
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
Plenum Press |
3
Conference Proceedings
Adaptable three-dimensional Monte Carlo modeling of imaged blood vessels in skin
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Quantitative modeling of tissue images using a parallel Monte Carlo method
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
American Institute of Chemical Engineers |
SPIE - The International Society of Optical Engineering |
Springer-Verlag |