The application of SMASH alignment system for 65-55-nm logic devices

Author(s):

M. Miyasaka ( NEC Electronics Corp. (Japan) )

H. Saito ( NEC Electronics Corp. (Japan) )

T. Tamura ( NEC Electronics Corp. (Japan) )

T. Uchiyama ( NEC Electronics Corp. (Japan) )

P. Hinnen ( ASML (Netherlands) )

H. Lee ( ASML (Netherlands) )

M. van Kemenade ( ASML (Netherlands) )

M. Shahrjerdy ( ASML (Netherlands) )

R. van Leeuwen ( ASML (Netherlands) )

4 more

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings