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SEM-contour-based OPC model calibration through the process window

Author(s):
J. Vasek ( Freescale Semiconductor, Inc. (USA) )
O. Menedeva ( Applied Materials, Inc. (Israel) )
D. Levitzky ( Applied Materials, Inc. (Israel) )
O. Lindman ( Applied Materials, Inc. (Israel) )
Y. Nemadi ( Applied Materials, Inc. (Israel) )
G. E. Bailey ( Mentor Graphics Corp. (USA) )
J. L. Sturtevant ( Mentor Graphics Corp. (USA) )
2 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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