Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography

Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography

Author(s):

C. S. Saravanan ( Nanometrics, Inc. (USA) )

S. Nirmalgandhi ( Nanometrics, Inc. (USA) )

O. Kritsun ( AMD (USA) )

A. Acheta ( AMD (USA) )

R. Sandberg ( AMD (USA) )

B. L. Fontaine ( AMD (USA) )

H. J. Levinson ( AMD (USA) )

K. Lensing ( AMD (USA) )

M. Dusa ( ASML US, Inc. (USA) )

J. Hauschild ( ASML US, Inc. (USA) )

A. Pici ( ASML US, Inc. (USA) )

6 more

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings

Details

TDL ID:	ZA00046825
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2007 : 21st
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.03.01

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