Development of Sn-fueled high-power DPP EUV source for enabling HVM

Development of Sn-fueled high-power DPP EUV source for enabling HVM

Author(s):

Y. Teramoto ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Z. Narihiro ( Extreme Ultraviolet Lithography System Development Association (Japan) )

D. Yamatani ( Extreme Ultraviolet Lithography System Development Association (Japan) )

T. Yokoyama ( Extreme Ultraviolet Lithography System Development Association (Japan) )

K. Bessho ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Y. Joshima ( Extreme Ultraviolet Lithography System Development Association (Japan) )

T. Shirai ( Extreme Ultraviolet Lithography System Development Association (Japan) )

S. Mouri ( Extreme Ultraviolet Lithography System Development Association (Japan) )

T. Inoue ( Extreme Ultraviolet Lithography System Development Association (Japan) )

H. Mizokoshi ( Extreme Ultraviolet Lithography System Development Association (Japan) )

G. Niimi ( Ushio Inc. (Japan) )

T. Hosokai ( Ushio Inc. (Japan) )

H. Yabuta ( Extreme Ultraviolet Lithography System Development Association (Japan) )

K. C. Paul ( Extreme Ultraviolet Lithography System Development Association (Japan) )

T. Takemura ( Extreme Ultraviolet Lithography System Development Association (Japan) )

T. Yokota ( Extreme Ultraviolet Lithography System Development Association (Japan) )

K. Kabuki ( Extreme Ultraviolet Lithography System Development Association (Japan) )

K. Miyauchi ( Extreme Ultraviolet Lithography System Development Association (Japan) )

K. Hotta ( Extreme Ultraviolet Lithography System Development Association (Japan) )

H. Sato ( Extreme Ultraviolet Lithography System Development Association (Japan) )

15 more

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings

Details

TDL ID:	ZA00046824
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2007 : 11th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.01

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