Debris mitigation techniques for a Sn- and Xe-fueled EUV-light source

Debris mitigation techniques for a Sn- and Xe-fueled EUV-light source

Author(s):

K. C. Thompson ( Univ. of Illinois at Urbana-Champaign (USA) )
S. N. Srivastava ( Univ. of Illinois at Urbana-Champaign (USA) )
E. L. Antonsen ( Univ. of Illinois at Urbana-Champaign (USA) )
D. N. Ruzic ( Univ. of Illinois at Urbana-Champaign (USA) )

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings

Details

TDL ID:	ZA00046824
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2007 : 11th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.01

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