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Photon sieve array x-ray maskless nanolithography

Author(s):
G. Cheng ( Institute of Optics and Electronics (China) and Graduate School, Chinese Academy of Sciences (China) )
T. Xing ( Institute of Optics and Electronics (China) )
W. Lin ( Institute of Optics and Electronics (China) )
J. Zhou ( Institute of Optics and Electronics (China) )
C. Qiu ( Institute of Optics and Electronics (China) )
Z. Liao ( Institute of Optics and Electronics (China) and Graduate School, Chinese Academy of Sciences (China) )
Y. Yang ( Institute of Optics and Electronics (China) and Graduate School, Chinese Academy of Sciences (China) )
L. Hong ( Univ. of Electronic Science and Technology of China (China) )
J. Ma ( Taishan College (China) )
4 more
Publication title:
Emerging lithographic technologies XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6517
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466365 [0819466360]
Language:
English
Call no.:
P63600/6517
Type:
Conference Proceedings

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