Three-dimensional X-ray lithography using a silicon mask with inclined absorbers

Author(s):

• H. Mekaru ( National Institute of Advanced Industrial Science and Technology (Japan) )
• T. Takano ( National Institute of Advanced Industrial Science and Technology (Japan) )
• K. Awazu ( National Institute of Advanced Industrial Science and Technology (Japan) )
• M. Takahashi ( National Institute of Advanced Industrial Science and Technology (Japan) )
• R. Maeda ( National Institute of Advanced Industrial Science and Technology (Japan) )

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings