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Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation

Author(s):
S. Matsunari ( Extreme Ultraviolet Lithography System Development Association (Japan) )
T. Aoki ( Extreme Ultraviolet Lithography System Development Association (Japan) )
K. Murakami ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Y. Gomei ( Canon Inc. (Japan) )
S. Terashima ( Extreme Ultraviolet Lithography System Development Association (Japan) )
H. Takase ( Extreme Ultraviolet Lithography System Development Association (Japan) )
M. Tanabe ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Y. Watanabe ( Extreme Ultraviolet Lithography System Development Association (Japan) )
Y. Kakutani ( Univ. of Hyogo (Japan) )
M. Niibe ( Univ. of Hyogo (Japan) )
Y. Fukuda ( Extreme Ultraviolet Lithography System Development Association (Japan) )
6 more
Publication title:
Emerging lithographic technologies XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6517
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466365 [0819466360]
Language:
English
Call no.:
P63600/6517
Type:
Conference Proceedings

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