A short-pulsed laser cleaning system for EUVL tool

A short-pulsed laser cleaning system for EUVL tool

Author(s):

M. Yonekawa ( Canon Inc. (Japan) )
H. Namba ( Canon Inc. (Japan) )
T. Hayashi ( Canon Inc. (Japan) )
Y. Watanabe ( Canon Inc. (Japan) )

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings

Details

TDL ID:	ZA00046824
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2007 : 11th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.01

Similar Items:

1 Conference Proceedings Design of imaging system for EUVL Kinoshita,H., Watanabe,T., Koike,M., Namioka,T. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Relaxation processes of exciton polaritons manifested in luminescent excitation spectra in Pbl₂ M. Watanabe, T. Hayashi Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Ultra-short pulse laser annealing Gamo, Kenji, Murakami, Kouichi, Kawabe, Mitsuo, Namba, Susumu, Aoyagi, Yoshinobu North Holland	8 Conference Proceedings Formation of nanopartictes by short and ultra-short laser pulses K. Gouriet, T. E. Itina, S. Noël, J. Hermann, M. Sentis Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Study of mask process development for EUVL Abe, T., Nishiguchi, M., Amano, T., Motonaga, T., Sasaki, S., Mohri, H., Hayashi, N., Tanaka, Y., Yamanashi, H., … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Design of EUVL camera with large numerical aperture Li,Y., Watanabe,T., Kinoshita,H. SPIE - The International Society for Optical Engineering
4 Conference Proceedings System and process learning in a full-field, high-power EUVL alpha tool Ballard, W.P., Tichenor, D.A., O'Connell, D.J., II, L.J.B., Lafon, R.E., Anderson, R.J.M., Leung, A.H., Williams, K.A., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Advances in high-power short-pulse fiber laser systems and technology (Invited Paper) Price, J.H.V., Malinowski, A., Piper, A., Belardi, F.He.W., Monro, T.M., Ibsen, M., Thomsen, B.C., Jeong, Y., Codemard, … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Development of EUVL mask blank in AGC [6349-93] Sugiyama, T., Kojima, H., Ito, M., Otsuka, K., Yokoyama, M., Mikami, M., Hayashi, K., Matsumoto, K., Kikugawa, S. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Progress in the development of three-aspherical mirror optics for EUVL Kinoshita,H., Watanabe,T., Bajuk,D.J., Daniel,J., Kimpara,Y., Kriese,M.D., Platonov,Y.Y. SPIE - The International Society for Optical Engineering
6 Conference Proceedings High-peak-power pulse laser for laser-induced breakdown Ueda,T., Wakamatsu,M., Tomosada,N., Hayashi,H., Sugiyama,T., Yagi,T., Ohmae,G. SPIE - The International Society for Optical Engineering	12 Conference Proceedings Short-pulse photolytic iodine laser Tate,R.F., Harris,M., Anderson,B.T., Hager,G.D. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12