Characteristics and prevention of pattern collapse in EUV lithography
- Author(s):
W. Chang ( Hanyang Univ. (South Korea) ) E. Kim ( Hanyang Univ. (South Korea) ) Y. Kang ( Hanyang Univ. (South Korea) ) S. Park ( Hanyang Univ. (South Korea) ) C. Lim ( Hynix Semiconductor Inc. (South Korea) ) K. Won ( Seoul National Univ. (South Korea) ) J. Kim ( Seoul National Univ. (South Korea) ) H. Oh ( Hanyang Univ. (South Korea) ) - Publication title:
- Emerging lithographic technologies XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6517
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466365 [0819466360]
- Language:
- English
- Call no.:
- P63600/6517
- Type:
- Conference Proceedings
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