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Characteristics and prevention of pattern collapse in EUV lithography

Author(s):
W. Chang ( Hanyang Univ. (South Korea) )
E. Kim ( Hanyang Univ. (South Korea) )
Y. Kang ( Hanyang Univ. (South Korea) )
S. Park ( Hanyang Univ. (South Korea) )
C. Lim ( Hynix Semiconductor Inc. (South Korea) )
K. Won ( Seoul National Univ. (South Korea) )
J. Kim ( Seoul National Univ. (South Korea) )
H. Oh ( Hanyang Univ. (South Korea) )
3 more
Publication title:
Emerging lithographic technologies XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6517
Pub. date:
2007
Vol.:
6517
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466365 [0819466360]
Language:
English
Call no.:
P63600/6517
Type:
Conference Proceedings

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