EUV lithography program at IMEC

Author(s):

A. M. Goethals ( IMEC (Belgium) )

R. Jonckheere ( IMEC (Belgium) )

G. F. Lorusso ( IMEC (Belgium) )

J. Hermans ( IMEC (Belgium) )

F. V. Roey ( IMEC (Belgium) )

A. Myers ( Intel Corp. (USA) )

M. Chandhok ( Intel Corp. (USA) )

I. Kim ( Samsung Electronics (South Korea) )

A. Niroomand ( Micron Technology (USA) )

F. Iwamoto ( Matsushita Electric Industrial Co., Ltd. (Japan) )

N. Stepanenko ( Qimonda (USA) )

R. Gronheid ( IMEC (Belgium) )

B. Baudemprez ( IMEC (Belgium) )

K. Ronse ( IMEC (Belgium) )

9 more

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings