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EUV lithography program at IMEC

Author(s):
A. M. Goethals ( IMEC (Belgium) )
R. Jonckheere ( IMEC (Belgium) )
G. F. Lorusso ( IMEC (Belgium) )
J. Hermans ( IMEC (Belgium) )
F. V. Roey ( IMEC (Belgium) )
A. Myers ( Intel Corp. (USA) )
M. Chandhok ( Intel Corp. (USA) )
I. Kim ( Samsung Electronics (South Korea) )
A. Niroomand ( Micron Technology (USA) )
F. Iwamoto ( Matsushita Electric Industrial Co., Ltd. (Japan) )
N. Stepanenko ( Qimonda (USA) )
R. Gronheid ( IMEC (Belgium) )
B. Baudemprez ( IMEC (Belgium) )
K. Ronse ( IMEC (Belgium) )
9 more
Publication title:
Emerging lithographic technologies XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6517
Pub. date:
2007
Vol.:
6517
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466365 [0819466360]
Language:
English
Call no.:
P63600/6517
Type:
Conference Proceedings

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