EUV lithography with the Alpha Demo Tools: status and challenges
- Author(s):
N. Harned ( ASML Wilton (USA) ) M. Goethals ( IMEC (Belgium) ) R. Groeneveld ( ASML Netherlands B.V. (Netherlands) ) P. Kuerz ( Carl Zeiss Semiconductor Manufacturing Technologies AG (Germany) ) M. Lowisch ( Carl Zeiss Semiconductor Manufacturing Technologies AG (Germany) ) H. Meijer ( ASML Netherlands B.V. (Netherlands) ) H. Meiling ( ASML Netherlands B.V. (Netherlands) ) K. Ronse ( IMEC (Belgium) ) J. Ryan ( CNSE/The Univ. at Albany (USA) ) M. Tittnich ( CNSE/The Univ. at Albany (USA) ) H. Voorma ( ASML Netherlands B.V. (Netherlands) ) J. Zimmerman ( ASML Wilton (USA) ) U. Mickan ( ASML Netherlands B.V. (Netherlands) ) S. Lok ( ASML Netherlands B.V. (Netherlands) ) - Publication title:
- Emerging lithographic technologies XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6517
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466365 [0819466360]
- Language:
- English
- Call no.:
- P63600/6517
- Type:
- Conference Proceedings
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