Stereolithography as a meso-structure for input force reduction to a capacitive force MEMS sensor

Stereolithography as a meso-structure for input force reduction to a capacitive force MEMS sensor

Author(s):

H. K. Chu ( Univ. of Toronto (Canada) )
J. K. Mills ( Univ. of Toronto (Canada) )
W. L. Cleghorn ( Univ. of Toronto (Canada) )

Publication title:

MEMS/MOEMS components and their applications IV : 22-23 January 2007, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6464

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819465771 [0819465771]

Language:

English

Call no.:

P63600/6464

Type:

Conference Proceedings

Details

TDL ID:	ZA00046772
Series ID:	PA00000029
Conf. info. (Name):	Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components : MEMS/MOEMS Components and Their Applications
Conf. info. (Number):	2007 : 4th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.01.22-2007.01.23

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