Atomic layer deposition of atomic mirror for silicon

Atomic layer deposition of atomic mirror for silicon

Author(s):

T. Fujimoto ( Osaka City Univ. (Japan) )
Y. Shiomi ( Osaka City Univ. (Japan) )
H. Kumagai ( Osaka City Univ. (Japan) )
A. Kobayashi ( Osaka City Univ. (Japan) )

Publication title:

Photon processing in microelectronics and photonics VI : 22-25 January 2007, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6458

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819465719 [0819465712]

Language:

English

Call no.:

P63600/6458

Type:

Conference Proceedings

Details

TDL ID:	ZA00046766
Series ID:	PA00000029
Conf. info. (Name):	SPIE LASE : Photon Processing in Microelectronics and Photonics
Conf. info. (Number):	2007 : 6th
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2007.01.22-2007.01.25

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