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Study of the thermal characteristic of x-ray mask during short-pulsed exposure

Author(s):
  • H. Shang ( Shanghai Maritime Univ. (China) )
  • Y. Wang ( Beijing Univ. of Aeronautics and Astronautics (China) )
Publication title:
Sixth International Symposium on Instrumentation and Control Technology: Signal Analysis, Measurement Theory, Photo -Electronic Technology, and Artificial Intelligence : 13-15 October 2006, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6357
Pub. date:
2006
Pt.:
2
Paper no.:
63573M
Page(from):
63573M-1
Page(to):
63573M-5
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464521 [081946452X]
Language:
English
Call no.:
P63600/6357
Type:
Conference Proceedings

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