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Detection of SiH3 Radicals and Cluster Formation in a Highly H2 Diluted SiH4 VHF Plasma by Means of Time Resolved Cavity Ring Down Spectroscopy

Author(s):
Publication title:
Amorphous and polycrystalline thin-film silicon science and technology--2006 : symposium held April 18-21, 2006, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
910
Pub. Year:
2007
Page(from):
219
Page(to):
224
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558998667 [1558998667]
Language:
English
Call no.:
M23500/910
Type:
Conference Proceedings

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