Patterning with spacer for expanding the resolution limit of current lithography tool [6156-27]
- Author(s):
Jung. W.-Y. ( Hynix Semiconductor Inc. (South Korea) ) Kim, C.-D. ( Hynix Semiconductor Inc. (South Korea) ) Eom, J-.D. ( Hynix Semiconductor Inc. (South Korea) ) Cho, S.-Y. ( Hynix Semiconductor Inc. (South Korea) ) Jeon, S.-M. ( Hynix Semiconductor Inc. (South Korea) ) Kim, J.-H. ( Hynix Semiconductor Inc. (South Korea) ) Moon, J.-I. ( Hynix Semiconductor Inc. (South Korea) ) Lee, B.-S. ( Hynix Semiconductor Inc. (South Korea) ) Park, S.-K. ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6156
- Pub. Year:
- 2006
- Page(from):
- 61561J
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461995 [0819461997]
- Language:
- English
- Call no.:
- P63600/6156
- Type:
- Conference Proceedings
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