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Patterning with spacer for expanding the resolution limit of current lithography tool [6156-27]

Author(s):
Jung. W.-Y. ( Hynix Semiconductor Inc. (South Korea) )
Kim, C.-D. ( Hynix Semiconductor Inc. (South Korea) )
Eom, J-.D. ( Hynix Semiconductor Inc. (South Korea) )
Cho, S.-Y. ( Hynix Semiconductor Inc. (South Korea) )
Jeon, S.-M. ( Hynix Semiconductor Inc. (South Korea) )
Kim, J.-H. ( Hynix Semiconductor Inc. (South Korea) )
Moon, J.-I. ( Hynix Semiconductor Inc. (South Korea) )
Lee, B.-S. ( Hynix Semiconductor Inc. (South Korea) )
Park, S.-K. ( Hynix Semiconductor Inc. (South Korea) )
4 more
Publication title:
Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6156
Pub. Year:
2006
Page(from):
61561J
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461995 [0819461997]
Language:
English
Call no.:
P63600/6156
Type:
Conference Proceedings

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