Impact of process variation on 65nm across-chip Iinewidth variation [6156-64]
- Author(s):
Hong, L. ( Mentor Graphics Corp. (USA) ) Brist, T. ( Mentor Graphics Corp. (USA) ) LaCour, P. ( Mentor Graphics Corp. (USA) ) Sturtevant, J. ( Mentor Graphics Corp. (USA) ) Niehoff, M. ( Mentor Graphics Corp. (Germany) ) Niedermaier, P. ( Infineon Technologies AG (Germany) ) - Publication title:
- Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6156
- Pub. Year:
- 2006
- Page(from):
- 61560Q
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461995 [0819461997]
- Language:
- English
- Call no.:
- P63600/6156
- Type:
- Conference Proceedings
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