Hot spot management in ultra-low kl lithography [6156-24]
- Author(s):
Hashimoto, K. ( Toshiba Corp. (Japan) ) Usui, S. ( Toshiba Corp. (Japan) ) Nojima, S. ( Toshiba Corp. (Japan) ) Tanaka, S. ( Toshiba Corp. (Japan) ) Yamanaka, E. ( Toshiba Corp. (Japan) ) Inoue, S. ( Toshiba Corp. (Japan) ) - Publication title:
- Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6156
- Pub. Year:
- 2006
- Page(from):
- 61560N
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461995 [0819461997]
- Language:
- English
- Call no.:
- P63600/6156
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Hot spot-based judgment methodology for high-end photomask availability for any exposure tools [6283-53]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
8
Conference Proceedings
Evaluation of lithography simulation model accuracy for hotspot-based mask quality assurance
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Model-based PPC verification methodology with two dimensional pattern feature extraction
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Contact hole formation by multiple exposure technique in ultralow-k1 lithography
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Yield-enhanced layout generation by new design for manufacturability (DfM) flow
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Virtual lithography system to improve the productivity of high-mix low-volume production
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Lithography simulation system for total CD control from design to manufacturing
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Mask pattern quality assurance based on lithography simulation with fine pixel SEM image [5992-59]
SPIE - The International Society of Optical Engineering |