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Meeting critical gate Iinewidth control needs at the 65 nm node [6156-23]

Author(s):
Mahorowala, A. ( IBM Systems and Technology Group (USA) )
Halle, S. ( IBM Systems and Technology Group (USA) )
Gabor, A. ( IBM Systems and Technology Group (USA) )
Chu, W. ( IBM Systems and Technology Group (USA) )
Barberet, A. ( IBM Systems and Technology Group (USA) )
Samuels, D. ( IBM Systems and Technology Group (USA) )
Abdo, A. ( IBM Systems and Technology Group (USA) )
Tsou, L. ( IBM Systems and Technology Group (USA) )
Yan, W. ( IBM Systems and Technology Group (USA) )
Iseda, S. ( Sony Electronics Inc (USA) )
Patel K ( IBM IBM Systems and Technology Group (USA) )
Dirahoui, B ( IBM IBM Systems and Technology Group (USA) )
Nomura, A ( Advanced Mirco Devices Inc (USA) )
Ahsan, I ( IBM IBM Systems and Technology Group (USA) )
Azam, F ( IBM IBM Systems and Technology Group (USA) )
Berg, G ( IBM IBM Systems and Technology Group (USA) )
Brendler, A ( IBM IBM Systems and Technology Group (USA) )
Zimmerman, J ( IBM IBM Systems and Technology Group (USA) )
Faure, T ( IBM IBM Systems and Technology Group (USA) )
14 more
Publication title:
Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6156
Pub. Year:
2006
Page(from):
61560M
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461995 [0819461997]
Language:
English
Call no.:
P63600/6156
Type:
Conference Proceedings

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