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Toward DFM: process worthy design and OPC through verification method using MEEF, TF・MEEF, and MTT [6156-21]

Author(s):
Kim, I.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Suh, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Jung, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, E. ( Samsung Electronics Co., Ltd. (South Korea) )
Kang, Y.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H. ( Samsung Electronics Co., Ltd. (South Korea) )
3 more
Publication title:
Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6156
Pub. Year:
2006
Page(from):
61560L
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461995 [0819461997]
Language:
English
Call no.:
P63600/6156
Type:
Conference Proceedings

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