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CD analysis of advanced photolithography and its impact on critical design structures [6156-12]

Author(s):
Romero, K. A. ( AMD Fab36 LLC ＆ Co. KG (Germany) )
Seltmann, R. ( AMD Fab36 LLC ＆ Co. KG (Germany) )
Burbach, G. ( AMD Fab36 LLC ＆ Co. KG (Germany) )
Stephan, R. ( AMD Fab36 LLC ＆ Co. KG (Germany) )
Paufler, J. ( AMD Saxony LLC ＆ Co. KG (Germany) )
Greenlaw, D. ( AMD Saxony LLC ＆ Co. KG (Germany) )
1 more
Publication title:
Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6156
Pub. Year:
2006
Page(from):
61560D
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461995 [0819461997]
Language:
English
Call no.:
P63600/6156
Type:
Conference Proceedings

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