Fabrication of relief gratings on high photosensitive Si02/Zr02 gel film by UV exposure [6149-23]

Fabrication of relief gratings on high photosensitive Si02/Zr02 gel film by UV exposure [6149-23]

Author(s):

Xu, X. ( Tongji Univ. (China) )

Zhou, B. ( Tongji Univ. (China) )

Liu, C. ( Tongji Univ. (China) )

Xu, C. ( Tongji Univ. (China) )

Wu, G. ( Tongji Univ. (China) )

Ni, X. ( Tongji Univ. (China) )

Shen, J. ( Tongji Univ. (China) )

2 more

Publication title:

2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6149

Pub. Year:

2006

Page(from):

61490N

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461889 [0819461881]

Language:

English

Call no.:

P63600/6149

Type:

Conference Proceedings

Details

TDL ID:	ZA00016428
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Advanced Optical Manufacturing and Testing Technologies
Conf. info. (Number):	2005 : 2nd
Conf. info. (Venue):	Xian, China
Conf. info. (Date):	2005.11.02-2005.11.05

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