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Advanced photomask repair technology for 65nm lithography (3) [5853-89]

Author(s):
Itou, Y.
Tanaka, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Sugiyama, Y.
Hagiwara, R.
Takahashi, H.
Takaoka, O.
Kozakai, T.
Matsuda, O.
Suzuki, K.
Okabe, M.
Kikuchi, S.
Uemoto, A.
Yasaka, A.
Adachi, T. ( SII NanoTechnology Inc. (Japan) )
Nishida, N. ( HOYA Co. (Japan) )
10 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. date:
2005
Pt.:
2
Page(from):
1000
Page(to):
1008
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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