
Advanced photomask repair technology for 65nm lithography (3) [5853-89]
- Author(s):
Itou, Y. Tanaka, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Sugiyama, Y. Hagiwara, R. Takahashi, H. Takaoka, O. Kozakai, T. Matsuda, O. Suzuki, K. Okabe, M. Kikuchi, S. Uemoto, A. Yasaka, A. Adachi, T. ( SII NanoTechnology Inc. (Japan) ) Nishida, N. ( HOYA Co. (Japan) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5853
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 1000
- Page(to):
- 1008
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- Language:
- English
- Call no.:
- P63600/5853
- Type:
- Conference Proceedings
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