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Introduction of a die-to-database verification tool for the entire printed geometry of a die: geometry verification system NGR2100 for DFM [5853-88]

Author(s):
Kitamura, T.
Kubota, K.
Hasebe, T.
Sakai, F.
Nakazawa, S.
Vohra, N.
Yamamoto, M. ( NanoGeometry Research Inc. (Japan) )
Inoue, M. ( Topcon Corp. (Japan) )
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
2
Page(from):
988
Page(to):
999
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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