Application of CPL mask for whole chip 5nm DRAM patterning [5853-69]
- Author(s):
Lin, 0. ( Toppan Chunghwa Electronics Corp. (Taiwan) ) Hung, R. ( Nanya Technology Corp. (Taiwan) ) Lee, B. ( Toppan Chunghwa Electronics Corp. (Taiwan) ) Wu, Y.-H. ( Nanya Technology Corp. (Taiwan) ) Kozuma, M. ( Toppan Chunghwa Electronics Corp. (Taiwan) ) Shih, C.-L. Lin, J. ( Nanya Technology Corp. (Taiwan) ) Hsu, M. Hsu, S. D. ( ASML MaskTools, Inc. (USA) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5853
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 835
- Page(to):
- 843
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- Language:
- English
- Call no.:
- P63600/5853
- Type:
- Conference Proceedings
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