Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process [5853-61]
- Author(s):
- Chang, Y. Y.
- Wu, Y.-H.
- Shih, C.-L.
- Lin, J. ( Nanya Technology Corp. (Taiwan) ) , ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
- Kan, F. ( Inotera Memories Inc. (Taiwan) )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5853
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 757
- Page(to):
- 766
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- Language:
- English
- Call no.:
- P63600/5853
- Type:
- Conference Proceedings
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