Simulation of quartz phase etch affect on performance of ArF chrome-less hard shifter for 65-nm technology [5853-57]
- Author(s):
- Park, K. T.
- Sczyrba, M.
- Bubke, K. ( Advanced Mask Technology Ctr. GmbH and Co. KG (Germany) )
- Pforr, R. ( Infineon Technology GmbH and Co. KG (Germany) )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5853
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 722
- Page(to):
- 730
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- Language:
- English
- Call no.:
- P63600/5853
- Type:
- Conference Proceedings
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