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The application of phase grating to CLM technology for the sub-65nm node optical lithography [5853-55]

Author(s):
Yoon, G.-S.
Kim, S.-H.
Park, J.-S.
Choi, S.-Y.
Jean, C.-U.
Shin, I.-K.
Choi, S.-W.
Han, W.-S. ( Samsung Electronics (South Korea) )
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
2
Page(from):
703
Page(to):
713
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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