Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]
- Author(s):
Hsu, M. Van Den Broeke, D. Laidig, T. Wampler, K. E. Hollerbach, U. Socha, R. Chen, J. F. Hsu, S. Shi, X. ( ASML MaskTools Inc. (USA) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5853
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 659
- Page(to):
- 671
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- Language:
- English
- Call no.:
- P63600/5853
- Type:
- Conference Proceedings
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