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Reticle SEM specifications required for lithography simulation [5853-36]

Author(s):
Kariya, M.
Yamanaka, E.
Tanaka, S.
Ikeda, T.
Yamaguchi, S.
Itoh, M. ( Toshiba Corp. (Japan) )
Kobayashi, H.
Kawashima, T.
Narukawa, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
4 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
2
Page(from):
550
Page(to):
555
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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