Simulation of resist heating effect with e-beam lithography using distributed processing (DP) [5853-18]
- Author(s):
Ki, W.-T. Ahn, B.-S. Park, J.-S. Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Ma, S.-B. ( Hanyang Univ. (South Korea) ) Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5853
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 416
- Page(to):
- 424
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- Language:
- English
- Call no.:
- P63600/5853
- Type:
- Conference Proceedings
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