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Simulation of resist heating effect with e-beam lithography using distributed processing (DP) [5853-18]

Author(s):
Ki, W.-T.
Ahn, B.-S.
Park, J.-S.
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Ma, S.-B. ( Hanyang Univ. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
1
Page(from):
416
Page(to):
424
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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