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Second level exposure for phase shift mask applications using an SLM-based DUV mask writer [5853-134]

Author(s):
Chandramouli, M.
Olshausen, B.
Korobko, Y.
Henrichs, S.
Qu, P.
Ma, J.
Auches, B.
Cole, D. ( Intel Corp. (USA) )
Ostrom, T.
Beyerl, A.
Eklund, R.
Zerne, R.
Goransson, P.
Persson, M.
Newman, T. ( Micronic Laser Systems AB (Sweden) )
10 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
1
Page(from):
398
Page(to):
407
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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