Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography [5853-112]

Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography [5853-112]

Author(s):

Yoshizawa, M. ( Sony Corp. (Japan) and IMEC (Belgium) )
Philipsen, V.
Leunissen, L. H. A. ( IMEC (Belgium) )

Publication title:

Photomask and Next-Generation Lithography Mask Technology XII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5853

Pub. Year:

2005

Pt.:

1

Page(from):

243

Page(to):

251

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458537 [0819458538]

Language:

English

Call no.:

P63600/5853

Type:

Conference Proceedings

Details

TDL ID:	ZA00016424
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2005 : 12th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2005.04.13-2005.04.15

Similar Items:

1 Conference Proceedings Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA Iithogra phy [6154-51] Yoshizawa, M., Philipsen, V., Leunissen, L. H. A. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications [5853-108] Philipsen, V., Leunissen, L., De Ruyter, R., Jonckheere, R., Marlin, P., Wakefield, C., Johnson, S., Cangemi, M., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53] Konishi, T., Kojima, Y., Okuda, Y., Philipsen, V., Leunissen, A. H. L., Van Look, L. SPIE - The International Society of Optical Engineering	8 Conference Proceedings ArF immersion lithography: critical optical issues Honda, T., Kishikawa, Y., Tokita, T., Ohsawa, H., Kawashima, M., Ohkubo, A., Yoshii, M., Uda, K., Suzuki, A. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123] Yoshizawa, M., Philipsen, V., Leunissen, A. H. L., Hendrickx, E., Jonckheere, R., Vandenberghe, G., Buttgereit, U., … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Impact of line width roughness on device performance [6152-32] Lorusso, G. F., Leunissen, L. H. A., Gustin, C., Mercha, A., Jurczak, M., Marchman, H. M., Azordegan, A. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Progress in 193nm immersion lithography at IMEC Ronse, K., Vandenberghe, G., Hendrickx, E., Leunissen, L. H. A., Aksenov, Y. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Performance of a 1.35NA ArF immersion lithography system for 40-nm applications J. de Klerk, C. Wagner, R. Droste, L. Levasier, L. Jorritsma, E. van Setten, H. Kattouw, J. Jacobs, T. Heil SPIE - The International Society of Optical Engineering
5 Conference Proceedings Determining the transfer function of a mask fabrication process Leunissen, P. L. H. A., Philipsen, V., Jonckheere, R. M. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Photomask lifetime issues in ArF lithography [5853-10] Eschbach, F., Coon, P., Greenebaum, B., Mittal, A., Sanchez, P., Tanzil, D., Ng, G., Yun, H., Sengupta, A. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Feasibility study of embedded binary masks [6349-21] Cangemi, M., Philipsen, V., Leunissen, L. H. A., Taylor, D. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Flare and its impact on low-k1 KrF and ArF lithography La Fontaine, B., Dusa, M.V., Acheta, A., Chen, C., Bourov, A., Levinson, H.J., Litt, L.C., Mulder, M., Seltman, R., van … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12