Blank Cover Image

Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications [5853-108]

Author(s):
Philipsen, V.
Leunissen, L.
De Ruyter, R.
Jonckheere, R. ( IMEC (Belgium) )
Marlin, P. ( Photronics (USA) )
Wakefield, C. ( Photronics (United Kingdom) )
Johnson, S.
Cangemi, M. ( Photronics (Belgium) )
Buxbaum, A.
Morrison, T. ( FEI Co. (USA) )
5 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
1
Page(from):
211
Page(to):
222
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Printability of topography in alternating aperture phase-shift masks

Philipsen, V.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Defect printability for 100-nm design rule using 193-nm lithography

Philipsen, V., Jonckheere, R.M., Kohlpoth, S., Torres, A.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Printability study for phase-shift masks at 193-nm lithography

Philipsen, V., Jonckheere, R.M.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Image imbalance compensation in alternating phase-shift masks towards the 45-nm node through-pitch imaging [5992-65]

Van Look, L., Kasprowicz, B., Zibold, A., Degel, W., Vandenberghe, G.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Manufacturability and printability of AAPSM with transparent etch stop layer [6281-54]

Cangemi, M., Philipsen, V., De Ruyter, R., Leunissen, L., Morgana, N., Sixt, P., Cottle, R., Kasprowicz, B.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]

Yoshizawa, M., Philipsen, V., Leunissen, A. H. L., Hendrickx, E., Jonckheere, R., Vandenberghe, G., Buttgereit, U., …

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Extended defect printability study for 100-nm design rule using 193-nm lithography

Philipsen, V., Jonckheere, R.M.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53]

Konishi, T., Kojima, Y., Okuda, Y., Philipsen, V., Leunissen, A. H. L., Van Look, L.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Printability of 2D mask quality

Philipsen, V., Jonckheere, R.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Photomask etch and profile control of 65nm chromeless phase lithography masks using scanning probe metrology [5853-58]

Anderson, S. A., Buxbaum, A., Kumar, A., Ibrahim, I.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Quartz etch process for alternating aperture phase shift masks (alt-APSM) [5853-20]

Srinivasan, S., Westerman, R., Plumhoff, J., Johnson, D., Constantine, C.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Printability of hard and soft defects in 193-nm lithography

Philipsen, V., Jonckheere, R.M., Kohlpoth S., Friedrich, C.M., Torres, J.A.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12