Blank Cover Image

Determination of mask induced polarization effects on AltPSM mask structures [5853-106]

Author(s):
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
1
Page(from):
194
Page(to):
201
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Mask defect printing mechanisms for future lithography generations [6154-49]

Erdmann, A., Graf T, Bubke K, Hollein I, Teuber S

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Mask-induced polarization effects at high NA

Lee, S. U., Park, J. L., Choi, J. S., Lee, J. G.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Study of stress birefringence for 1 93-nm immersion photomasks [5853-02]

Cotte, E., Selle, M., Bubke, K., Teuber, S.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Defect inspection strategy of LEEPL masks [5853-82]

Yonekura, I., Kunitani, S., Susa, T., Itoh, K., Tamura, A., Maruyama, S.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings VUV spectrophotometry for photomasks characterization at 193 nm [5965-59]

Yang, M., Leiterer, J., Gatto, A., Kaiser, N., Hollein, I., Teuber, S., Bubke, K.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Investigation of polarization effects on new mask materials

Itakura, Y., Kawasa, Y., Wakabayashi, O., Moriya, M., Nagai, S., Sumitani, A., Hagiwara, T., Ishimaru, T., Tsuji, S., …

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Determination of mask induced polarization effects occurring in hyper NA immersion lithography

Huang, W. C., Lai, C. M., Luo, B., Tsai, C. K., Tsay, C. S., Lai, C. W., Kuo, C. C., Liu, R. G., Lin, H. T., Lin, B. J.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Influence of mask manufacturing process on printing behavior of angled line structures [6154-168]

Teuber, S., Durr, A. C., Herguth, H., Kunkel, G., Wandel, T., Zell, T.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Aerial image based mask defect detection in dense array structures [5853-85]

Kohle, R., Hennig, M., Pforr, R., Bubke, K., Sczyrba, M., Durr, A. C.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Simulation of quartz phase etch affect on performance of ArF chrome-less hard shifter for 65-nm technology [5853-57]

Park, K. T., Sczyrba, M., Bubke, K., Pforr, R.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Influence of mask induced polarization effects on a pattern printability

Ishimaru, T., Matsuura, S., Seki, M., Fujii, K., Koizumi, R., Hakataya, Y., Moriya, A.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Applicability of alternating phase shifting masks using polarized light [6154-164]

Bubke, K., Sczyrba, M., Pierrat, C

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12