Character-build standard-cell layout technique for high-throughput character-projection EB lithography [5853-102]

Character-build standard-cell layout technique for high-throughput character-projection EB lithography [5853-102]

Author(s):

Fujino, T.
Kajiya, Y.
Yoshikawa, M. ( Ritsumeikan Univ. (Japan) )

Publication title:

Photomask and Next-Generation Lithography Mask Technology XII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5853

Pub. Year:

2005

Pt.:

1

Page(from):

160

Page(to):

167

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458537 [0819458538]

Language:

English

Call no.:

P63600/5853

Type:

Conference Proceedings

Details

TDL ID:	ZA00016424
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2005 : 12th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2005.04.13-2005.04.15

Similar Items:

1 Conference Proceedings Shot number estimation for EB direct writing for logic LSI utilizin character-build standard-cell layout technique [6283-56] Kajiya, Y., Nakamura, A., Yoshikawa, M., Fujino, T. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Optical system for high-throughput EUV lithography Katagiri,S., Ito,M., Yamanashi,H., Seya,E., Terasawa,T. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Shot reduction technique for character projection lithography using combined cell stencil [5992-96] Kazama, T., Ikeda, M., Asada, K. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Progress on the realization of the electron column modules for SCALPEL high-throughput/alpha electron projection lithography tools Stenkamp,D., Kienzle,O., Orchowski,A., Rau,W.D., Weickenmeier,A., Benner,G., Wetzke,M., Waskiewicz,W.K., Katsap,V., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Technology mapping technique for throughput enhancement of character projection equipment [6151-36] Sugihara, M., Takata, T., Nakamura, K., Inanami, R., Hayashi, H., Kishimoto, K., Hasebe, T., Kawano, Y., Matsunaga, Y., … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Boundary-based cellwise OPC for standard-cell layouts D. M. Pawlowski, L. Deng, M. D. F. Wong SPIE - The International Society of Optical Engineering
4 Conference Proceedings Supercritical resist dry technique for electron-beam projection lithography (EPL) Petricich, G., Suzuki, K., Munemasa, J., Yoshikawa, T., Kawakami, N., Shimizu, S., Watanabe, M. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Large-area high-throughput high-resolution lithography systems for optoelectronics and microelectronics Jain,K., Dunn,T.J., Farmiga,N., Zemel,M. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Shot minimization for throughput improvement of character projection electron beam direct writing H. Pham Dinh Minh, T. lizuka, M. Ikeda, K. Asada Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Mapper: high throughput maskless lithography E. Slot, M. J. Wieland, G. de Boer, P. Kruit, G. F. ten Berge Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Improving the efficiency of pattern extraction for character projection lithography using OPC optimization H. Nosato, T. Matsunawa, H. Sakanashi, M. Murakawa, T. Higuchi Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Fast modeling of 3D planar resist images for high-NA projection lithography Ivin,V.V., Larin,D.Yu., Lucas,K.D., Makhviladze,T.M., Rogov,A.A., Verzunov,S.V. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12