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The unified mask data format based on OASIS for VSB EB writers [5853-101]

Author(s):
Suzuki, T.
Hirumi, J. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hojyo, Y. ( Hitachi High-Technologies Co. (Japan) )
Kawase, Y. ( JEOL Ltd. (Japan) )
Sakamoto, S. ( NuFlare Technology Inc. (Japan) )
Kuriyama, K.
Narukawa, S.
Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
1
Page(from):
152
Page(to):
159
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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