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Dual layer patterning failures in complex RET processes using ORC tools and pre- or post-optical proximity correction strategy [5853-100]

Author(s):
Couderc, C.
Belledent, J.
Borjon, A. ( Philips Semiconductors (France) )
Trouiller, Y. ( CEA-LETI (France) )
Sundermann, F. ( STMicroelectronics (France) )
Lucas, K. ( Freescale Semiconductors (France) )
Urbani, J.C.
Foussadier, F. ( STMicroelectronics (France) )
Rody, Y. ( Philips Semiconductors (France) )
Patterson, K. ( Freescale Semiconductors (France) )
Baron, S. ( STMicroelectronics (France) )
6 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
1
Page(from):
141
Page(to):
151
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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