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Monitoring system of CD error analysis for the 90-nm node mask manufacturing [5853-11]

Author(s):
Yu, S.-Y.
Kim, S.-H.
Cha, B.-C.
Kim, Y.-H.
Choi, S.-W.
Yoon, H.-S.
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
1
Page(from):
83
Page(to):
89
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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