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Validation of Nu-Flare e-beam emulation software in a simulation environment [5853-06]

Author(s):
Ritter, D. ( Sigma-C GmbH (Germany) )
Brooker, P.
Lewellen, J. ( Sigma-CAD, Inc. (USA) )
Ham, Y.-M.
Martin, P.
Cottle, R. ( Photronics, Inc. (USA) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
1
Page(from):
52
Page(to):
57
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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