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High performance FEP-171 resist process in combination with NTAR7 and NTAR5 chrome and the Sigma7300 DUV mask writer [5853-04]

Author(s):
Xing, K.
Karlsson, J.
Paulson, A.
Bjornberg, C.
Lundvall, A.
Hogfeldt, P.
Vedenpaa, J.
Goodoree, R.
Bjuggren, M. ( Micronic Laser Systems AB (Sweden) )
4 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
1
Page(from):
31
Page(to):
41
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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