Inverse lithography technology at low k1: placement and accuracy of assist features [6349-186]

Inverse lithography technology at low k1: placement and accuracy of assist features [6349-186]

Author(s):

Moore, A.

Abrams, D. ( Luminescent Technologies, Inc. (USA) )

1 more

Publication title:

Photomask Technology 2006

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6349

Pub. Year:

2006

Pt.:

2

Page(from):

63494T

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

Language:

English

Call no.:

P63600/6349

Type:

Conference Proceedings

Details

TDL ID:	ZA00016353
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2006 : 26th
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2006.09.19-2006.09.22

Similar Items:

1 Conference Proceedings Inverse lithography technology principles in practice: unintuilive patterns [5992-102] Liu, Y., Abrams, D., Pang, L., Moore, A. SPIE - The International Society of Optical Engineering	7 Conference Proceedings First 65-nm tape-out using inverse lithography technology (ILT) [5992-67] Hung, C. -Y., Zhang, B., Tang, D., Guo, E., Pang, L., Liu, Y., Moore, A., Wang, K. SPIE - The International Society of Optical Engineering
2 Conference Proceedings SRAF placement and sizing using inverse lithography technology T. Lin, F. Robert, A. Borjon, G. Russell, C. Martinelli, A. Moore, Y. Rody SPIE - The International Society of Optical Engineering	8 Conference Proceedings Laser and e-beam mask-to-silicon with inverse lithography technology (ILT) [5992-74] Pang, L., Shamma, N., Rissman, P., Abrams, D. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Inverse lithography technology (ILT): a natural solution for model-based SRAF at 45-nm and 32-nm L. Pang, Y. Liu, D. Abrams SPIE - The International Society of Optical Engineering	9 Conference Proceedings Inverse lithography technology at chip scale [6154-41] Lin, B., Shieh, M. F., Sun, J., Ho, J., Wang, Y., Wu, X., Leitermann, W., Lin, O., Lin, J., Liu, Y., Pang, L. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Inverse lithography technology (OLT): What is the impact to the photomask industry? [6283-106] Pang, L., Liu, Y., Abrams, D. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Inverse lithography technology (ILT): keep the balance between SRAF and MRC at 45 and 32 nm L. Pang, Y. Liu, T. Dam, K. Mihic, T. Cecil Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Fast inverse lithography technology [6154-55] Abrams, D. S., Pang, L. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Pushing the lithography limit: applying inverse lithography technology (ILT) at the 65nm generation [6154-58] Hung, C. Y., Zhang, B., Guo, E., Pang, L., Liu Y, Wang K, Dai G SPIE - The International Society of Optical Engineering
6 Conference Proceedings Enhancing DRAM printing process window by using inverse lithography technology (ILT) [6154-142] Chu, C. W., Tsao,B, Chiou, K., Lee, S., Huang, J., Liu, Y, Lin,T, Moore A, Pang,L SPIE - The International Society of Optical Engineering	12 Conference Proceedings Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO) L. Pang, G. Xiao, V. Tolani, P. Hu, T. Cecil Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12