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Efficient approach to improving pattern fidelity with multi-OPC model and recipe [6349-182]

Author(s):
Do, M.
Kang, J.
Choi, J.
Lee, J.
Lee, Y.
Kim, K.
Dongbu Electronics (South Korea)
2 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
63494P
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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