Blank Cover Image

The effect of sub-layer condition on the OPC model [6349-181]

Author(s):
Choi, J.
Kang, J.
Shim, Y.
Yun, K.
Lee, J.
Lee, Y.
Kim, K. ( Dongbu Electronics (South Korea) )
2 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
63494O
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Advanced new OPC method to improve OPC accuracy for sub-90nm technology

J. Choi, J. Kang, Y. Shim, K. Yun, J. Hong, Y. Lee, K. Kim

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Full chip compensation for local-flare-induced CD error using OPC/DRC method

J.-Y. Choi, Y.-A. Shim, K.-H. Yun, J.-D. Kim, J.-H. Kim

Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Efficient approach to improving pattern fidelity with multi-OPC model and recipe [6349-182]

Do, M., Kang, J., Choi, J., Lee, J., Lee, Y., Kim, K., Dongbu Electronics (South Korea)

SPIE - The International Society of Optical Engineering
8 Conference Proceedings OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect

Y. Kim, I. Kim, J. Park, S. Kim, S. Suh, Y. Cheon, S. Lee, J. Lee, C. Kang, J. Moon, J. Cobb

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Mask process variation induced OPC accuracy in sub-90 nm technology node [6154-138]

Park, S.J., Shim, Y.A., Kang, J.H., Choi,J Y, Yoon K H, Lee Y S, Kim K

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Inductively Coupled Ar/CCl2F4/Cl2 Plasma Etching of Ge

T. Kim, S. Choi, T. Jeong, S. Kang, K. Shim

Electrochemical Society
4 Conference Proceedings Methodology to set up accurate OPC model using optical CD metrology and atomic force microscopy

Y. Shim, J. Kang, S. Lee, J. Kim, K. Kim

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Fundamental study on the error factor for sub 90nm OPC modeling

H. Lee, S.-U. Lee, J. Kim, K. Kim

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Study of the mask topography effect on the OPC modeling of hole patterns

S. Shim, Y. Kim, S. Lee, S. Choi, W. Han

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Fulfillment of model-based OPC for contact patterns in 60-nm level logic device

Kim, S.-W., Lee, S.-W., Park, C.-M., Choi, S.-H., Lee, Y.-M., Kang, Y., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings OPC to account for thick mask effect using simplified boundary layer model [6349-133]

Kim, S., Kim, Y.-C., Suh, S., Lee, S., Cho, H., Moon, J., Cobb, J.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Combination of rule and pattern based lithography unfriendly pattern detection in OPC flow

J. H. Kang, J.-Y. Choi, Y.-A. Shim, H.-S. Lee, B. Su

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12