Blank Cover Image

Advanced femtosecond DUV laser mask repair tool for large area photomasks [6349-172]

Author(s):
Treyger, L.
Heyl, J.
Fink, M.
Koren, I.
Li, Y. ( Controlled Semiconductor, Inc. (USA) )
Ronning, D. ( Lite Enterprises, Inc. (USA) )
Small, F.
Xian, B. ( Controlled Semiconductor, Inc. (USA) )
3 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
63494G
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Integration of optical inspection and metrology functions into DUV femtosecond laser repair tool for large-area FPD photomasks

L. Treyger, J. Heyl, D. Ronning, D. Ducharme

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Femtopulse laser-based mask repair in the DUV wavelength regime [6283-43]

Ghadiali, F., Tolani, V., Nagpal, R., Robinson, T., LeClaire, J., Bozak, R., Lee, A. D., White, R.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Advanced photomask repair technology for 65-nm lithography [6349-50]

Aramaki, F., Kozakai, T., Muramatsu, M., Sugiyama, Y., Koyama, Y., Matsuda, O., Suzuki, K., Okabe, M., Doi, T., …

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Precise and high-throughput femtopulse laser mask repair of large defects [6349-171]

White, R., LeClaire, J., Robinson, T., Dinsdale, A., Bozak, R., Lee, D. A.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings DUV printability of laser repairs on binary and attenuated phase-shift masks

Reynolds,J.A., Schellenberg,F.M., Hibbs,M.S., Hayden,D.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings The specification of the 45-nm node photomask repair process [6349-173]

Sung, M. G., Huh, S., Cha, B. C., Choi, S., Han, W.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Printability and repair techniques for DUV photomasks

Gans,F., Jess,M., Kohlpoth,S., Pforr,R.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings High-resolution mask inspection in advanced tab [6349-28]

Maelzer, S., Poock, A., Reese, B., Bhattacharyya, K., Mirzaagha, F., Cox, S., Lang, M.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings MARS2: an advanced femtosecond laser mask repair tool

Wagner, A., Haight, R.A., Longo, P.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings The automatic back-check mechanism of mask tooling database and automatic transmission of mask tooling data [6349-141]

Xu, Z., Peng, M. G., Tu, L. H., Lee, C., Lin, J. K., Jan, J. F., Yin, A., Wang, P.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Photomask repair using an advanced laser-based repair system (MARS2)

Schmidt, M.R., Flanigan, P., Thibault, D.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Improved photomask accuracy with a high-productivity DUV laser pattern generator [6349-34]

ostrom, T., Mahlen, J., Karawajczyk, A., Rosling, M., Carlqvist, P., Askebjer, P., Karlin, T., Sallander, J., osterberg, …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12