Revisiting mask contact hole measurements [6349-158]
- Author(s):
Higuchi, M. ( Toppan Electronics Inc. (USA) ) Gallagher, E. ( IBM Microelectronics (USA) ) Ceperley, D. ( Univ. of California, Berkeley (USA) ) Brunner, T. Bowley, R. McGuire, A. ( IBM Microelectronics (USA) ) - Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 634947
- Page(to):
- 634948
- Pages:
- 2
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
8
Conference Proceedings
Aerial image measurement technique for fast evaluation of 193-nm lithography masks
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Verification of the effect of mask on the mask error enhancement factor of contact holes
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Aerial image measurement technique for today's and future 193-nm lithography mask requirements
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Contact hole CD and profile metrology of binary and phase-shift masks: effect of modeling strategies in application of scafferometery [6349-22]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |