Blank Cover Image

A new critical dimension metrology for chrome-on-glass substrates based on S-parameter measurements extracted from coplanar waveguide test structures [6349-157]

Author(s):
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
634946
Page(to):
634946
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Noncontact electrical critical dimensions metrology sensor for chrome photomasks

Guillaume,N., Lahti,M., Cresswell,M.W., Allen,R.A., Linholm,L.W., Zaghloul,M.E.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Simulation of critical dimension and profile metrology based on scatterometry method [6349-57]

Chalykh, R., Pundaleva, I., Kim, S., Cho, H.-K., Moon, J.-T.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Traceable atomic force microscope dimensional metrology at NIST [6152-25]

Dixson, R., Orji, N. G., Fu, J., Cresswell, M., Allen, R., Guthrie, W.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings CD reference materials for sub-10th μm applications

Cresswell, M.W., Bogardus, E.H., de Pinillos, J.V.M., Bennett, M.H., Allen, R.A., Guthrie, W.F., Murabito, C.E., am …

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Single crystal critical dimension reference materials (SCCDRM): process optimization for the next generation of standards

R. G. Dixson, W. F. Guthrie, M. Cresswell, R. A. Allen, N. G. Orji

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Transition from precise to accurate critical dimension metrology

V. A. Ukraintsev, M. C. Tsai, T. Lii, R. A. Jackson

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Coplanar waveguides on SOI and OPS substrates

Gamble,H.S., Leong,K.O., Raza,S.H., Armstrong,B.M., Mitchell,S.J.N., Yang,S., Fusco,V.F., Stewart,J.A.C.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Comparison of properties of electrical test structures patterned in BESOI and SIMOX films for CD reference-material applications

Allen,R.A., Ghoshtagore,R.N., Cresswell,M.W., Linholm,L.W., Sniegowski,J.J.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings TEM calibration methods for critical dimension standards

N. G. Orji, R. G. Dixson, D. I. Garcia-Gutierrez, B. D. Bunday, M. Bishop, M. W. Cresswell, R. A. Allen, J. A. Allgair

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Measurement results on after-etch resist coated features on the new Leica Microsystems' LWM270 DUV critical dimension metrology system

Whittey, J. M., Steinberg, W.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings LithoCell-integrated critical dimension metrology

Stirton, J.B., Miller, C.W., Viswanathan, A., Miyagi, M., Lane, L., Laughery, M.A., Parikh, T., Chan, K.C., Sezginer, A.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Electrical test structures replicated in silicon-on-insulator material

Cresswell,M.W., Sniegowski,J.J., Ghoshtagore,R.N., Allen,R.A., Linholm,L.W., Villarrubia,J.S.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12